Résumé
ISO 14606:2015 gives guidance on the optimization of sputter-depth profiling parameters using appropriate single-layered and multilayered reference materials in order to achieve optimum depth resolution as a function of instrument settings in Auger electron spectroscopy, X-ray photoelectron spectroscopy and secondary ion mass spectrometry.
ISO 14606:2015 is not intended to cover the use of special multilayered systems such as delta doped layers.
Informations générales
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État actuel: AnnuléeDate de publication: 2015-12Stade: Annulation de la Norme internationale [95.99]
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Edition: 2
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Comité technique :ISO/TC 201/SC 4ICS :71.040.40
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Cycle de vie
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Précédemment
AnnuléeISO 14606:2000
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Actuellement
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Révisée par
PubliéeISO 14606:2022