Resumen
This document provides guidelines for measuring the sputtered depth in sputtered depth profiling.
The methods of sputtered depth measurement described in this document are applicable to techniques of surface chemical analysis when used in combination with ion bombardment for the removal of a part of a solid sample to a typical sputtered depth of up to several micrometres. The depth typically determined by this approach is between 1 nm to 500 µm.
Preview
Previsualice esta norma en nuestra Plataforma de navegación en línea (OBP)
Informaciones generales
-
Estado: PublicadoFecha de publicación: 2021-03Etapa: Norma Internacional publicada [60.60]
-
Edición: 2Número de páginas: 13
-
Comité Técnico :ISO/TC 201/SC 4ICS :71.040.40
- RSS actualizaciones
Ciclo de vida
-
Anteriormente
RetiradaISO/TR 15969:2001
-
Ahora
Got a question?
Check out our FAQs
Customer care
+41 22 749 08 88
Opening hours:
Monday to Friday - 09:00-12:00, 14:00-17:00 (UTC+1)