Reference number
ISO 23170:2022
© ISO 2025
International Standard
ISO 23170:2022
Surface chemical analysis — Depth profiling — Non-destructive depth profiling of nanoscale heavy metal oxide thin films on Si substrates with medium energy ion scattering
Edition 1
2022-06
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Published (Edition 1, 2022)

ISO 23170:2022

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Format
CHF 155
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Abstract

This document specifies a method for the quantitative depth profiling of amorphous heavy metal oxide ultrathin films on Si substrates using medium energy ion scattering (MEIS).

General information

  • Status
     : Published
    Publication date
     : 2022-06
    Stage
    : International Standard published [60.60]
  • Edition
     : 1
    Number of pages
     : 29
  • Technical Committee :
    ISO/TC 201/SC 4
    ICS :
    71.040.40 
  • RSS updates

Life cycle

Sustainable Development Goals

This standard contributes to the following Sustainable Development Goals

9
Industry, Innovation and Infrastructure
7
Affordable and Clean Energy

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