ISO 14606:2015 gives guidance on the optimization of sputter-depth profiling parameters using appropriate single-layered and multilayered reference materials in order to achieve optimum depth resolution as a function of instrument settings in Auger electron spectroscopy, X-ray photoelectron spectroscopy and secondary ion mass spectrometry.
ISO 14606:2015 is not intended to cover the use of special multilayered systems such as delta doped layers.
Status: WithdrawnPublication date: 2015-12
Edition: 2Number of pages: 16
Technical Committee: ISO/TC 201/SC 4 Depth profiling
- ICS :
- 71.040.40 Chemical analysis
This standard contributes to the following Sustainable Development Goals:
ISO 14606:2015Stage: 95.99
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