Status : Published (Under review)

This standard was last reviewed and confirmed in 2019. Therefore this version remains current.
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Abstract

ISO 17331:2004 specifies chemical methods for the collection of iron and/or nickel from the surface of silicon-wafer working reference materials by the vapour-phase decomposition method or the direct acid droplet decomposition method.

It applies to iron and/or nickel atomic surface densities from 6 times 10 to the power 9 atoms per square centimetre to 5 times 10 to the power 11 atoms per square centimetre.

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General information

  • Status
     : Published
    Publication date
     : 2004-05
    Stage
    : International Standard confirmed [90.93]
  • Edition
     : 1
    Number of pages
     : 18
  • Technical Committee :
    ISO/TC 201
    ICS :
    71.040.40 
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Life cycle

Sustainable Development Goals

This standard contributes to the following Sustainable Development Goals

7
Affordable and Clean Energy
9
Industry, Innovation and Infrastructure

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